Aultimut International’s rotatable targets have significant advantages over planar targets.Rotatable sputtering targets typically have available more target material and greater utilization of target material compared to planar targets. This in turn yields much longer production runs and reduced downtime of production and the system. The significant and bottom-line positive benefit is an increase in the throughput of the production and coating equipment.
Secondly, the rotatable sputtering targets typically allow the use of higher power densities as the heat build-up is spread evenly over the surface area of the target. This results in increased deposition rates and improved performance during most reactive sputtering processes and runs.Below are rotatable sputtering targets that are currently available.
If you do no see your current material represented in this list, please send a note with your requirements, your specification and your near terms and long term needs and we will be glad to send you a quotation.